Stephen R. Heller
USDA, ARS
Beltsville, MD 20705
(srheller@gig.usda.gov)
QPAT
Oishi; Konosuke, et. al.
Date of Patent: Apr. 1, 1997
Assignee:
Appl. Number: 95US-539258
Filed: Oct. 5, 1995
Oct. 11, 1994 JP..................................94JP-6-245039Int. Cl.-6
US4540884 9/1985 Stafford et al..............250282000 US4955717 9/1990 Henderson...................250288000 US5179278 1/1993 Douglas.....................250292000 US5481107 1/1996 Takada et al................250288000
Spectrochimica ACTA., vol. 49B, No. 9, pp. 901-914 Konosuke Oishi et al.: Elemental Mass Spectrometry Using a Nitrogen Microwave-induced Plasma as an Ion Source, May 1994.
Primary Examiner - Berman; Jack I.
Assistant Examiner - Nguyen; Kiet T.
Attorney, Agent, or Firm - Kenyon & Kenyon
A plasma ion mass spectrometer capable of improving detection accuracy in
mass spectrometry by reducing background noise due to ultraviolet
radiation and neutral particles, and a plasma ion mass spectrometry using
the same. A sample is ionized with plasma in a plasma generating portion.
The flow of the ionized sample is shielded by a shield plate after an
elapse of a specified time, and ions of the sample accumulated before the
shielding is held in an ion trap type mass spectrometric portion for a
specified time. The ions of the sample held for the specified time are
then subjected to mass spectrometry. During ions of the sample accumulated
before the shielding are held, ultraviolet radiation mixed with the ions
of the sample disappears, and thereby only ions of the sample can be
subjected to mass spectrometry. As a result, background noise is reduced,
to improve detection accuracy in mass spectrometry.
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ABSTRACT:
A plasma ion mass spectrometer capable of improving detection accuracy in mass spectrometry by reducing background noise due to ultraviolet radiation and neutral particles, and a plasma ion mass spectrometry using the same. A sample is ionized with plasma
in a plasma generating portion. The flow of the ionized sample is shielded by a shield plate after an elapse of a specified time, and ions of the sample accumulated before the shielding is held in an ion trap type mass spectrometric portion for a specifi
ed time. The ions of the sample held for the specified time are then subjected to mass spectrometry. During ions of the sample accumulated before the shielding are held, ultraviolet radiation mixed with the ions of the sample disappears, and thereby only
ions of the sample can be subjected to mass spectrometry. As a result, background noise is reduced, to improve detection accuracy in mass spectrometry.
16
CLAIMS: First Claim Shown (Show all
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RELATED U.S. APPLICATIONS: none
FOREIGN APPLICATION PRIORITY DATA:
ABSTRACT
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5616918 :
Plasma ion mass spectrometer and plasma mass spectrometry using the same
INVENTORS: Oishi; Konosuke, Mito, Japan
Okumoto; Toyoharu, Hitachinaka, Japan
Tsukada; Masamichi, Higashi, Japan
Iino;
Takashi, Hitachinaka, JapanASSIGNEES:
Hitachi, Ltd., Tokyo, Japan
ISSUED: Apr. 1 , 1997 FILED: Oct. 5 , 1995 SERIAL NUMBER: 539258 FEE STATUS:
INTL. CLASS (Ed. 6):
H01J 49/06; U.S. CLASS:
250-288;
250-281;
250-282; FIELD OF SEARCH:
250-288,288 A,281,282,290,291,292
; AGENTS:
Kenyon & Kenyon;
Patent No. Patentee Issue Date 4955717
Henderson Sep. 1 , 1990 4540884
Stafford et al. Sep. 1 , 1985 5481107
Takada et al. Jan. 1 , 1996 5179278
Douglas Jan. 1 , 1993
No patents reference this one
We claim:
FOREIGN REFERENCES: noneApplication No. Country Date 6-245039 Japan Oct. 11, 1994
PRIMARY/ASSISTANT EXAMINERS: Berman; Jack I.; Nguyen; Kiet T.
ADDED TO DATABASE: Apr. 2 , 1997
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